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Journal Articles Environmental Pollution Year : 2023

Trace metal sorption on nanoplastics: An innovative analytical approach combining surface analysis and mass spectrometry techniques

Abstract

The mass and volume concentration of nanoplastics is extremely low, but incredibly high in terms of surface area; this is expected to increase their toxicity through the ab/adsorption and transport of chemical co-pollutants such as trace metals. In this context, we studied the interactions between nanoplastics model materials functionalized with carboxylated groups, with either smooth or raspberry-like surface morphologies, and copper as representative of trace metals. For this purpose, a new methodology, using two complementary surface analysis techniques: Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) and X-ray Photoelectron Spectroscopy (XPS) was developed. In addition, inductively coupled plasma mass spectrometry (ICP-MS) was used to quantify the total mass of sorbed metal on the nanoplastics. This innovative analytical approach from the top surface to the core of nanoplastics demonstrated not only the interactions with copper at the surface level, but also the ability of nanoplastics to absorb metal at their core. Indeed, after 24 h of exposition, the copper concentration at the nanoplastic surface remained constant due to saturation whereas the copper concentration inside the nanoplastic keeps increasing with the time. The sorption kinetic was evaluated to increase with the density of charge of the nanoplastic and the pH. This study confirmed the ability of nanoplastics to act as metal pollutant carriers by both adsorption and absorption phenomena.
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Dates and versions

hal-04015914 , version 1 (07-03-2023)

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Antoine Aynard, Cécile Courrèges, Javier Jiménez-Lamana, Anassya Raad, Christelle Miqueu, et al.. Trace metal sorption on nanoplastics: An innovative analytical approach combining surface analysis and mass spectrometry techniques. Environmental Pollution, 2023, 323, pp.121229. ⟨10.1016/j.envpol.2023.121229⟩. ⟨hal-04015914⟩
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